搜索 - 科创

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RHEED即Reflection High Energy Electron Diffraction，是表面物理膜层生长的重要表征手段之一，广泛的集成在MBE，PLD，LMBE，MOCVD等外延生长

采用分子梁取向附生(MBE)或金属有机化学蒸汽沉积(MOCVD)方法把氮化镓和氮化镓铝作为生长层增加到基础基底上。这里，氮化镓层和氮化镓铝层按顺序(取向附生式生长)形成，进而构成基底结构。

磊晶目前有两种，一种是化学的MOCVD，一种是物理的MBE。 SiGe 1980 年代IBM 为改进Si 材料而加入Ge，以便增加电子流的速度，减少耗能及改进功能，却意外成功的结合了Si 与Ge。

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